This Temescal Model BJD-1800 E-Beam Evaporator is designed for thin metal film deposition for research and development applications.

Temescal BJD-1800 Bell Jar Type Vacuum Thin Film Deposition System set up for 5 inch wafers..
- 208V
- 3 Phase
- 60 Hz
Simba2 15KW E-Beam
- 208-240VAC
- 3 phase, 70A, 60Hz

The unit does the roughing pump, cryo pump, and compressor.
This was removed from the lab to upgrade to a new machine. There was an electrical problem with the 4 way valve that should be repairable.

The e-beam evaporator can be used for the deposition of electroplating base layers on a variety of substrates. Substrates include Silicon wafers, Plexiglas (PMMA) wafers for transfer mask applications, and Kapton for prototype x-ray mask fabrication. The standard plating base utilized for these applications is typically 50-100 Angstroms of chrome as an adhesion promoter for 200-300 Angstroms of gold.

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